Zirconium (Zr)

  • Barium Cerium Yttrium Zirconate Sputtering Targets (BaCe(1-x-y)Y(x)Zr(y)O3)
    aterial Notes Barium Cerium Yttrium Zirconate Sputtering Targets, Purity is 99.9%,Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Ferroelectric Gate Dielectric For CMOS Features High purity Custom Sizes Available Manufacturing Proce
  • Barium Zirconate (BaZrO3) Sputtering Targets
    Advanced Engineering Materials sputtering targets have been widely used in applications from ferromagnetic thin films, semiconducting films, photoconductive films, high index films in infrared filters, capacitor dielectric films, lubricant films, magnetic and memory elements. AEMProduct manufactures
  • Fused Zirconia
    Description Fused zirconia is produced from zircon sand, which is one of the minerals found in heavy mineral sand sedimentary deposits derived from the alteration of granitic or alkaline rocks. In order to produce fused zirconia, zircon sand is reduced and fused in an electric arc furnace under a te
  • Lead Zirconate (PbZrO3) Sputtering Targets
    Applications Ferroelectric Gate Dielectric For CMOS Features High purity Custom Sizes Available Manufacturing Process Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate Cleaning and final packaging, Cleaned for use in vacuum, Protection from environmental contaminants Protect
  • Lead Zirconium Titanate (PZT) Sputtering Targets
    Applications Ferroelectric Gate Dielectric For CMOS Features High purity Custom Sizes Available Manufacturing Process Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate Cleaning and final packaging, Cleaned for use in vacuum, Protection from environmental contaminants Protect
  • Molybdenum TZM Products
    TZM Description: TZM Molybdenum is an alloy of 0.50% Titanium, 0.08% Zirconium and 0.02% Carbon with the balance Molybdenum. TZM Molybdenum is manufactured by either P/M or Arc Cast technologies and is of great utility due to its high strength/high temperature applications, especially above 2000F. T
  • Strontium Zirconate (SrZrO3) Sputtering Targets
    Strontium Zirconate (Strontium Zirconium Oxide) is generally immediately available in most volumes. High purity, submicron and nanopowderforms may be considered. Material Notes Strontium Zirconate Sputtering Target, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch
  • YSZ (Y2O3/ZrO2) Sputtering Targets
    Yttria-stabilized zirconia (YSZ) is a ceramic in which the crystal structure of zirconium dioxide is made stable at room temperature by an addition of yttrium oxide. These oxides are commonly called zirconia (ZrO2) and yttria (Y2O3), hence the name. Material Notes Zirconia Fully Stabilized with Yttr
  • YSZ Grinding Media
    Description YSZ Grinding Media is made of Yttria Stabilized Zirconia Polycrystal. Zirconia, in its unstabilized form has monoclinic, square or cubic crystal phases. On partial stabilization by Yttria (Yttrium Oxide), the resultant phase is tetragonal endowing it with very high hardness wear resistan
  • Yttria Stabilized Zirconia
    Description Dense white powder of high chemical purity containing yttria. Good sintering properties. Yttria-stabilized zirconia (YSZ) is a zirconium-oxide based ceramic, in which the particular crystal structure of zirconium oxide is made stable at room temperature by an addition of yttrium oxide. T
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