Copper (Cu)

  • Copper Oxide (CuO) Evaporation Materials
    Copper oxide is a compound from the two elements copper and oxygen.Copper does not react with water because the oxygen in water is locked into a compound with one part oxygen and two parts hydrogen. Copper(I) oxide is referred to as cuprous oxide. Material Notes AEM Deposition provides Zirconium Oxi
  • Copper Oxide (CuO) Sputtering Targets
    Cupric oxide (CuO) is a p-type semiconductor having a band gap of 1.211.51 eV and monoclinic crystal structure. In recent years, copper-oxide-based materials have found applications in various areas including heterogeneous catalysis, gas sensing, superconducting, and solar energy conversion. Copper
  • Copper Powder
    Introduction: Copper powder can be divided into electrolytic copper powder and atomized copper powder. The electrolytic copper powder is light rose red dendritic. The copper powder produced by electrolysis has high purity and the particles are dendritic. After subsequent treatment, the dendritic sha
  • Copper Selenide (Cu2Se) Sputtering Targets
    Intensive research has been performed in the past to study the fabrication and characterization of copper selenide in the form of thin films because of its potential application in solar cell technology. Copper selenide is a semiconductor with a wide range of stoichiometric compositions and also wit
  • Copper Silver (Cu/Ag 84:16 wt%) Sputtering Targets
    Material Notes Copper Silver Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Semiconductor Chemical vapor deposition (CVD) Physical vapor deposition (PVD) display Features Competitive pricing High
  • Copper Sulfide (Cu2S) Sputtering Targets
    Copper (I) Sulfide is an indirect gap semiconductor with a bulk bandgap of 1.21 eV. Its use in combination with CdS as a solar cell material was extensively investigated between the 1960s and 1980s. Advanced Engineering Materials Limited can supply high quality Cu2S sputtering targets and evaporatio
  • Copper Sulfide (CuS) Sputtering Targets
    Copper monosulfide is a chemical compound of copper and sulfur. It occurs in nature as the dark indigo blue mineral covellite. It is a moderate conductor of electricity. A black colloidal precipitate of CuS is formed when hydrogen sulfide, H2S, is bubbled through solutions of Cu(II) salts. It is one
  • Copper Tungsten Alloy
    Description of Copper Tungsten Alloy: Copper tungsten Alloy (W-Cu), also called tungsten copper alloy, is the composite of tungsten and copper which own it excellent performance of tungsten and copper. It is used widely in such industries as engine, electric power, electron, metallurgy, spaceflight
  • Copper Zinc (Cu/Zn 50/50 wt%) Sputtering Targets
    Material Notes Copper Zinc Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Semiconductor Chemical vapor deposition (CVD) Physical vapor deposition (PVD) display Features Competitive pricing High p
  • Gold Copper (Au/Cu) Sputtering Targets
    Material Notes Gold Copper Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Semiconductor Chemical vapor deposition (CVD) Physical vapor deposition (PVD) display Features Competitive pricing High p
  •