Hafnium sputtering target

Introduction

Hafnium (Hf) is a lustrous silver grey, ductile, transition metal. The Hafnium metal is further purified to crystal bars using the van Arkel/de Boer iodine process. Hafnium will resist corrosion in air due to the formation of an oxide film, although powdered hafnium will burn in air.  Hafnium thin film coating can also be used to provide surface hardness and protection. AEM produce Hafnium sputtering targets with highest quality, refined crystal bars, which ensures high purity, low zirconium content, and high reliability.    

Specification

Chemical Formula	Hf
Atomic Weight	178.49
Color/ Appearance	Gray Steel, Metallic
Melting point	2227℃
Thermal Conductivity	23 W/m.K
Coefficient of Thermal Expansion	5.9 x 10-6/K
Theoretical Density (g/cc)	13.31
Z Ration	0.36
Sputter	DC
Max powder Density (Watts/Square Inch)	50
Type of Bond	Indium, Elastomer

Size

Description	Typical purity	Size	Shape
Hafnium Sputtering Targets	Hf + Zr>99.99%,	Circular: Diameter < 14inch, Thickness > 1mm;	Disc, Plate
	Zr<0.2%, 0.3%&0.5%	Block: Length < 32inch, Width < 12inch, Thickness > 1mm	Column, Step, Custom-made

Applicatiom

1. Used in deposition processes including semiconductor deposition, chemical vapor deposition (CVD) and physical vapor deposition (PVD).
2. Used for optics including wear protection, decorative coatings, and displays.