Niobium Sputtering Target
Material Type |
Niobium |
Z Ratio |
0.492 |
Symbol |
Nb |
Sputter |
DC |
Atomic Weight |
92.90638 |
Max Power Density* |
100 |
Atomic Number |
41 |
(Watts/Square Inch) |
Color/Appearance |
Gray, Metallic |
Type of Bond |
Indium, Elastomer |
Thermal Conductivity |
54 W/m.K |
Comments |
Attacks W source. |
Melting Point (°C) |
2,468 |
|
|
Coefficient of Thermal Expansion |
7.3 x 10-6/K |
|
|
Description:
Purity: Nb>99.9%, 99.95%, 99.99%, 99.995%
Standard: ASTM B393-05
Density: >8.3g/cc
Recrystallization: >95%
Surface Roughness: Ra 0.8-1.6
Flatness: 0.1mm or 0.1%AEM can provide niobium target with uniform, high density microstructure and controlled texture, which promotes uniform sputtering rates and generally superior sputtering behavior.
Specification:
We can supply 8″, 12″ niobium round shape sputtering target. The largest disc target that we can provide is with 29” diameter. Below are most of the standard sizes for our tantalum rectangle sputtering targets. If you do not see the size that you need, please feel free to contact us.
Thickness |
Width |
Length |
Parallelism |
Verticality |
Surface finish |
8.0~16.0 |
10~450 |
10~500 |
<0.05 |
<2o |
<Ra0.8 |
3.0~8.0 |
10~450 |
10~800 |
<0.05 |
<2o |
<Ra0.8 |
1.0~3.0 |
10~450 |
10~1200 |
<0.05 |
<2o |
<Ra0.8 |