Advanced Engineering Materials’ customized target products made of high purity raw material powder with super fine grain size, together with the distinguished homogeneous microstructure to achieve desired characteristics of sputtering deposited thin film and the longer life for target. We can fabricate most materials in specific geometries to fit all commercially available or custom designed systems. Our sputtering target products include oxides, ceramics, nitrides, carbides, borides, refractories, zone refined materials, ferrous, non-ferrous and precious metals. We deliver rotatable, tubular sputtering targets up to 3,000 mm length, planar sputtering targets up to 4,000 mm length or circular sputtering targets with individual diameters up to 800 mm. Bonding service is offered on request for all kind of sputtering targets.
Purity:99.9% ~ 99.99%