Aluminum Silicon Copper (Al/Si/Cu) Sputtering Targets

High-purity AlSiCu sputtering targets are available for all PVD systems. Available for round, rectangular, S-Gun, ConMag, Quantum, Delta, Ring and multi-tiled configurations in purities ranging from 99.9% to 99.999%.

Advanced Engineering Materials’ customized sputtering targets have been accepted in a wide range of applications from Magnetic Data Storage, Glass, Electronics / Semiconductor, Photovoltaics, Display, Solar Thermal and Wear Resistance to name but a few. AEMProduct provides high performance sputtering targets in a wide range of materials, including non-ferrous and precious metals, engineered specialty alloys, oxides, ceramics and specialty inorganic thin film PVD chemicals. Depending on the required material targets can be manufactured from 1 inch up to 20 inches in diameter, rectangular targets are available from small to over 1000mm lengths in single or multi sections.

Purity:99.9% ~ 99.999%
Part No:AEMST-AlSiCu