Advanced Engineering Materials’ customized target products made of high purity raw material powder with super fine grain size, together with the distinguished homogeneous microstructure to achieve desired characteristics of sputtering deposited thin film and the longer life for target. AEMProduct offers a complete line of sputtering targets ranging from ceramics, metals, and elemental forms for use in R&D, pilot and full-scale production, with purities ranging from 99,9% to 99,9999% in any form and shape, including bonding and backing-plates for most types of sputtering systems. Depending on the required material targets can be manufactured from 1 inch up to 20 inches in diameter, rectangular targets are available from small to over 1000mm lengths in single or multi sections.
Purity:99.9% ~ 99.99%
Part No:AEMST-Bi3Fe5O12