Pure Copper Targets for Sputtering, Round Copper Metal Target, Purity 99.999%

Copper (Cu) Sputtering Targets

General of Copper

Copper is a chemical element with symbol Cu (from Latin: cuprum) and atomic number 29. It is a soft, malleable, and ductile metal with very high thermal and electrical conductivity. A freshly exposed surface of pure copper has a reddish-orange color. Copper is used as a conductor of heat and electricity, as a building material, and as a constituent of various metal alloys, such as sterling silver used in jewelry, cupronickel used to make marine hardware and coins, and constantan used in strain gauges and thermocouples for temperature measurement.

Material Notes of Copper Sputtering Targets

Purity: 99.99-99.999%
Circular: Diameter <= 14inch, Thickness >= 1mm
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm
Targets Type: Planar sputtering target, Rotary sputtering target

Analysis of Copper Sputtering Targets

AEM Deposition manufacture copper sputtering targets with high purity, it’s most important benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. The analytical methods we use includes:

1. Metallic elements were analyzed using ICP-OES.
2. Gas elements were analyzed using LECO.

Below form is a Certificate of Analysis (COA) for 99.999% high purity Copper Sputtering Target: