Lanthanum Vanadium Oxide (LaVO3) Sputtering Targets
Applications
• Ferroelectric
• Gate Dielectric
• For CMOS
Features
• High purity
• Custom Sizes Available
Manufacturing Process
• Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate
• Cleaning and final packaging, Cleaned for use in vacuum,
Protection from environmental contaminants
Protection during shipment
Options
• 99.9% ex Strontium Minimum Purity
•Up to 12'' Diameter Targets Available
•Planar Tiles Up to 8'' X 5'' for Larger Target Configurations