Aluminum （Al）

Aluminum oxide is a versatile and technologically important material because of its wide transparency window from ultra-violet to mid-infrared, good thermal and chemical stability, and superior electrical and mechanical properties. Especially aluminum oxide in thin film form has a broad application

AEMProducts Scandium Aluminum alloys developed for high and very high-strength extrusions, offering exceptionally high fatigue properties and the same positive manufacturing propensities. Advanced Engineering Materials customized sputtering targets have been accepted in a wide range of applications

Aluminum Scandium Alloys are available as bar, Ingot, ribbon, wire, shot, sheet, and foil. Ultra high purity and high purity forms also include aluminum scandium alloy powder powder, submicron powder and nanoscale, targets for thin film deposition, and pellets for chemical vapor deposition (CVD) and

AEMProduct can offer 99.999% purity Aluminum Silicon (AlSi 99/1, AlSi 95/5, AlSi 90/10, AlSi 88/12, AlSi 80/20, AlSi 75/25, AlSi 65/35, AlSi 50/50) Sputtering Targets and Evaporation Materials with high density and distinguished homogeneous microstructurs. Advanced Engineering Materials sputtering t

High-purity AlSiCu sputtering targets are available for all PVD systems. Available for round, rectangular, S-Gun, ConMag, Quantum, Delta, Ring and multi-tiled configurations in purities ranging from 99.9% to 99.999%. Advanced Engineering Materials customized sputtering targets have been accepted in

To meet cutting edge RD needs or large production requirements, AEMProduct offers a full range of product and service solutions for high-purity PVD sputtering targets or evaporation materials. We also have an experienced technical team developing innovative new products. AEMProduct provides Ceramic

AEM Deposition specializes in producing high purity Aluminum-doped Zinc Oxide (AZO) Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applica

Material Notes Copper Aluminum Oxide Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm.

Iron Aluminum Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Semiconductor Chemical vapor deposition (CVD) Physical vapor deposition (PVD) display Features Competitive pricing High purity Grain re

Lanthanum Aluminate Sputtering Targets, Purity is 99.9%; Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness an