Oxide Targets

Aluminum oxide is a versatile and technologically important material because of its wide transparency window from ultra-violet to mid-infrared, good thermal and chemical stability, and superior electrical and mechanical properties. Especially aluminum oxide in thin film form has a broad application

Advanced Engineering Materials customized sputtering targets have been accepted in a wide range of applications from Magnetic Data Storage, Glass, Electronics / Semiconductor, Photovoltaics, Display, Solar Thermal and Wear Resistance to name but a few. AEMProduct offers a complete line of sputtering

As a worldwide manufacture and marketer of specialty materials for use in the thin film industry, Advanced Engineering Materials offers a diversified range of materials that span from commercial grade to highest purity, zone refined Ultra-Pure grade. These materials can be fabricated to fit all comm

AEM Deposition specializes in producing high purity Aluminum-doped Zinc Oxide (AZO) Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applica

Material Notes Barium Carbonate Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Ferroelectric Gate Dielectric For CMOS Features High purity Custom Sizes Available Manufacturing Process Manufacturi

aterial Notes Barium Cerium Yttrium Zirconate Sputtering Targets, Purity is 99.9%,Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Ferroelectric Gate Dielectric For CMOS Features High purity Custom Sizes Available Manufacturing Proce

Material Notes Barium Ferrite Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Ferroelectric Gate Dielectric For CMOS Features High purity Custom Sizes Available Manufacturing Process Manufacturing

Advanced Engineering Materials (AEMProduct) is a leading manufacturer of high-purity, thin film deposition materials used in the semiconductor, data storage, LED, wireless, aerospace defense, photonics and life sciences markets. We deliver materials, matched in their quality parameters in an optimal

To meet cutting edge RD needs or large production requirements, AEMProduct offers a full range of product and service solutions for high-purity PVD sputtering targets or evaporation materials. We also have an experienced technical team developing innovative new products. We can fabricate most materi

Advanced Engineering Materials customized sputtering targets have been accepted in a wide range of applications from Magnetic Data Storage, Glass, Electronics / Semiconductor, Photovoltaics, Display, Solar Thermal and Wear Resistance to name but a few. AEMProduct manufactures sputtering targets for

Advanced Engineering Materials sputtering targets have been widely used in applications from ferromagnetic thin films, semiconducting films, photoconductive films, high index films in infrared filters, capacitor dielectric films, lubricant films, magnetic and memory elements. AEMProduct manufactures

Beryllium oxide is used in many high-performance semiconductor parts for applications such as radio equipment because it has good thermal conductivity while also being a good electrical insulator. As a worldwide manufacture and marketer of specialty materials for use in the thin film industry, Advan

Advanced Engineering Materials customized sputtering targets have been accepted in a wide range of applications from Magnetic Data Storage, Glass, Electronics / Semiconductor, Photovoltaics, Display, Solar Thermal and Wear Resistance to name but a few. We can fabricate most materials in specific geo

Advanced Engineering Materials customized target products made of high purity raw material powder with super fine grain size, together with the distinguished homogeneous microstructure to achieve desired characteristics of sputtering deposited thin film and the longer life for target. AEMProduct off

Advanced Engineering Materials customized target products made of high purity raw material powder with super fine grain size, together with the distinguished homogeneous microstructure to achieve desired characteristics of sputtering deposited thin film and the longer life for target. AEMProduct man

Advanced Engineering Materials (AEMProduct) is a leading manufacturer of high-purity, thin film deposition materials used in the semiconductor, data storage, LED, wireless, aerospace defense, photonics and life sciences markets. We deliver materials, matched in their quality parameters in an optimal

General Cerium(IV) oxide, also known as ceric oxide, ceric dioxide, ceria, cerium oxide or cerium dioxide, is an oxide of the rare earth metal cerium. It is a pale yellow-white powder with the chemical formula CeO2. It is an important commercial product and an intermediate in the purification of the

AEMProduct sputtering targets have been accepted in a wide range of applications from ferromagnetic thin films, high index films in infrared filters, semiconducting films, capacitor dielectric films, photoconductive films, lubricant films, magnetic and memory elements to name but a few. Manufacturin

Material Notes Cobalt Oxide Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm.

Material Notes Copper Aluminum Oxide Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm.